Extract to table

The risk of examiner rejections based on combinations of the Pinnacle patents with references disclosing impedance-grading or impedance-tapering concepts in non-silicon material systems (lithium niobate and III-V compound semiconductors) is moderate to high, and the prosecution team must be prepared to present robust arguments distinguishing OWS's silicon-photonic-specific approach from these non-analogous references

The '417 patent directly overlaps with the technological space of OWS's Sub-Family A claims and represents the primary reference that OWS's claims must design around

The response must emphasize that N-2 operates in a fundamentally different material system (LiNbO₃ vs

The response must distinguish on material system (InP vs

While statutory double patenting is a narrower doctrine than ODP (requiring claim identity rather than merely obviousness), it must be considered in the context of OWS's existing patent portfolio

Complete prosecution histories for OWS's potentially overlapping issued patents must be obtained from Kessler & Morin LLP's files